# Photoresists: Regulation

How export licences on resist became a diplomatic weapon

Source page: https://www.materialinsights.org/chemicals/photoresists/regulation/

What this tab covers How it is regulated and what could disrupt supply: hazard classification, rules in the EU, US and India, anti-dumping duties and other trade measures, and supply-risk notes.

#### Hazards

| Classification | UN number | Key risks |
|---|---|---|
| flammable liquid (solvent); some components skin sensitisers or reproductive toxicants (indicative) | commonly UN1993 flammable liquid n.o.s. (indicative) | Solvent flammability; PFAS components. |

#### Main rules

| Where | Rule | Effect |
|---|---|---|
| **EU** | REACH; universal PFAS restriction proposal (ECHA, 2023) with semiconductor uses seeking derogation (indicative) | reformulation of fluorinated PAGs and surfactants |
| **Japan** | Export licensing for EUV resists (2019 Korea episode) | strategic leverage |
| **US** | Export controls on advanced chip technology to China (indicative) | limits Chinese access to leading-edge materials |

#### India

| Rule | Effect |
|---|---|
| **Semicon India Programme and Semicon 2.0 (Rs 1,27,500 crore, about $13-15 billion, approved by the Union Cabinet in July 2026) with incentives for speciality materials** | could fund local resist formulation |
| **Petroleum Rules 2002 and MSIHC Rules for solvent storage (indicative)** | licensing for flammable solvents |

#### Trade measures

- Japanese export licensing (2019)
- US chip export controls affect Chinese demand

#### Supply risk

Very high concentration in a few Japanese firms for ArF and EUV resists; the 2026 naphtha shock showed upstream risk. Not on mineral critical lists but treated as strategic by Japan, Korea and China.

## Other sections

- [Summary](https://www.materialinsights.org/chemicals/photoresists/index.md)
- [Overview](https://www.materialinsights.org/chemicals/photoresists/overview/index.md)
- [Correlation](https://www.materialinsights.org/chemicals/photoresists/correlation/index.md)
- [Production route](https://www.materialinsights.org/chemicals/photoresists/routes/index.md)
- [Production](https://www.materialinsights.org/chemicals/photoresists/production/index.md)
- [Feedstocks](https://www.materialinsights.org/chemicals/photoresists/feedstocks/index.md)
- [Cycles](https://www.materialinsights.org/chemicals/photoresists/cycles/index.md)
- [Trading](https://www.materialinsights.org/chemicals/photoresists/trading/index.md)
- [Movement](https://www.materialinsights.org/chemicals/photoresists/movement/index.md)
- [Characteristics](https://www.materialinsights.org/chemicals/photoresists/characteristics/index.md)
- [Emissions](https://www.materialinsights.org/chemicals/photoresists/emissions/index.md)
- [Relationships](https://www.materialinsights.org/chemicals/photoresists/links/index.md)